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Q-Mass Study on C-Au-S Film Formation by Co-operation Process of Plasma CVD and Sputtering
     
  
  
刊名:
電子情報通信学会技術研究報告
作者:
Q-Mass spectroscopy
Co-operation process of plasma CVD and sputtering
HF dissociation
Carbon gold sulfide
刊号:
734D0133-38
ISSN:
0913-5685
出版年:
2003
年卷期:
2003, vol.103, no.565
页码:
27-32
总页数:
6
分类号:
TN0
关键词:
Abul Kashem
;
Shinzo Morita
参考中译:
语种:
eng
文摘:
A new carbon gold sulfide (C-Au-S) film was formed by co-operation process of plasma CVD of CH{sub}4, SF{sub}6 and Ar mixture gas and sputtering of gold. X-ray diffraction spectra of C-Au-S film and chemical shift of C, Au and S atom shows that the gold atom in the film is atomically distributed and chemically bonded with sulfur and carbon. The refractive index of the C-Au-S film was measured to be 2.5-3.3, however this value was apparently small compared to the expected value from the electronic polarizability and the atomic composition of C, Au and S. Because of this kind of inconsistent result, it was supposed that the film contains conductive C-Au-S granular molecules. Quadrupole mass (Q-Mass) spectra during co-operation process of plasma CVD and sputtering were measured to study carbon gold sulfide (C-Au-S) film deposition kinetics. Unexpectedly C-Au-S molecule was detected, this fact confirmed that HF dissociation from the source mixture gas and C-Au-S molecule formation is important reaction for C-Au-S film formation.
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