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A new apparatus of measuring particle sizes of the order of nanometer (2nd) report - evaluation of measuring system by using standard particles -

刊名：	International Journal of the Japan Society for Precision Engineering.
作者：	Hiroshi An Yuzo Mori Tosihiko Kataoka Kasuyoshi Endo Kohji Inagaki Kazuya Yamamura Kazuto Yamauchi Takashige Fukuike
刊号：	798D0065*
出版年：	1994
年卷期：	1994, vol.28, no.4
页码：	356-361
总页数：	6
分类号：	TH7
关键词：	Nanometer；Particle sizes；Raw Si wafer；Light-scattering method；Ar{sup}+ laser；Standard particles；Particle diameter；Nondestructively
参考中译：
语种：	eng
文摘：	This paper deals with the development of a new method for measuring particle sizes of nm order on the raw silicon(Si) wafers by using a light-scattering method with Ar{sup}+ laser. In this study, the sample models to be measured were made by adhering the standard particles, of which the particle diameter is known, on the surfaces of Si wafers. Using the developed measuring system for the sample, the measurement of particle parameter was attempted to evaluate this measuring method. It was confirmed that this measuring method had an ability to detect the diameter of standard fine particle's with relatively high accuracy. According to this, it was able to be verified that this measuring method could nondestructively measure the particle diameter in nm order.